HBAR sensor based on ALN thin films acoustic bulk wave resonator

Li Kan,Dong Shu-Rong,Wang De-Miao
2006-01-01
Abstract:High mode acoustic bulk wave resonator (HBAR) has a simple semiconductor process and good high-frequency properties. HBAR is analyzed and fabricated in this paper. Based on MBVD model, the relationship between HBAR working mode and its structure is concluded. Through the relationship, a HBAR sensor on silicon wafer is designed with ADS of Agilent. The thickness of silicon wafer is 210μm. The structure is bottom electrode layer Al 200nm-2000nm AIN-top electrode layer Al 200nm. So HBAR works on 2GHz and has resonant frequency spacing 20MHz. The HBAR is fabricated on the (111) silicon wafer with double polished face. The AlN thin films with high c-axis orientation are deposited by RF reactive magnetron sputtering. This fabricated device is measured by network analyzer. The resonant frequency spacing is 22MHz and closed to designed device. This sensor has a simple semiconducting two dimension plan IC processing and steady structure.
What problem does this paper attempt to address?