Electrically Tunable Film Bulk Acoustic Resonator Based On Au/Zno/Al Structure

s r dong,x l bian,hao jin,n n hu,jian zhou,hei wong,m j deen
DOI: https://doi.org/10.1063/1.4818157
IF: 4
2013-01-01
Applied Physics Letters
Abstract:An electrically tunable Au/N-ZnO/ZnO/Al film bulk acoustic resonator (FBAR) is proposed. The stack resonator is Au-piezoelectric ZnO layer-Al while Schottky diode junction is Au/N-ZnO semiconductor layer. The FBAR's resonance frequency changes as the junction capacitance decreases with reverse bias. Our experiments gave a frequency shift of similar to 30 kHz/V at 1.46GHz, maximum insertion loss similar to 0.7 dB, and a very high Q factor above 1200. Circuit simulations indicated a tunable range of similar to 3.8 MHz from optimizing the FBAR's structure and doping concentration of N-ZnO. Electrical tunability decreases from 27 kHz/V to 1.5 kHz/V with temperatures from 30 degrees C to 105 degrees C. (C) 2013 AIP Publishing LLC.
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