Newly Developed Technique for Permittivity Measurement of Thin Film by Perturbation

Shurong Dong,Demiao Wang,Hao Jin
DOI: https://doi.org/10.3969/j.issn.1672-7126.2006.z1.005
2006-01-01
Abstract:A novel technique has been developed to evaluate permittivity of thin films, based on cavity perturbation and standardized calibration. In the technique, first, pick up a substrate with known permittivity; next, measure the cavity resonance frequencies of the empty cavity, the cavity with the substrate inside, and the cavity with the film grown on the substrate inside, respectively; and finally, derive the permittivity of the film. The permittivity of MgTiO3-CaTiO3(MCT) and SiO2, films was measured by the newly developed technique with high accuracy in microwave frequency.
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