A System for Measurement of Line Width by Combining Polarization Interferometry with Confocal Microscopy

LIU Zhong-yao,YAN Ju-qun,ZHANG Rui,LIN De-jiao,YIN Chun-yong,YE Xiao-you,XU Jie
DOI: https://doi.org/10.3321/j.issn:1000-1158.2005.02.005
2005-01-01
Abstract:A novel system for measuring the step height and line width of mask plates is proposed, which combines polarization interferometry with confocal microscopy. The orthogonally linearly-polarized light from a Transverse Zeeman Laser (TZL) is used as the light source. By locating the focus precisely, the most measurable facular is obtained. Then, the phase drift of the TE-polarized light and the TM-polarized light (their orientation of vibration of electrical field is parallel or perpendicular to the edge) are measured by the heterodyne interferometry method after they were reflected by the edge. So the edge is localized when the phase drift is analyzed by computer. The system has strong ability of anti-environmental disturbance for it meets with the rule of common path. The result of the measurement for an international standard line-width specimen with the NIM's Atomic Force Microscope (AFM) is quite agreed with that of our system. The results also show the system has good repeatability with maximum deviation of 20 nm when the same line is measured for 5 times.
What problem does this paper attempt to address?