Research of SiO2-hydrosol Flows Properties in Centrifugal Spin with Fluorescence Technique

Lei Zhang,Jianbin Luo,Chaohui Zhang
DOI: https://doi.org/10.3969/j.issn.0254-0150.2005.02.013
2005-01-01
Abstract:To experimentally study the mechanism of chemical mechanical polishing (CMP), the SiO2-hydrosol flows properties in centrifugal spin were explored with the help of fluorescence technique. Result shows that, when the distance of the polishing pad and the glass disk lies in the range of 0.3-0.9 mm, the thickness of SiO2-hydrosol in the center of the polishing pad falls during rotating, and the trend is greatly manifested with the rate increasing, while the thickness in the fringe increase slightly. Then typical pressure distribution was numerically simulated. The pressure varies with the position in the radial direction. The maximum pressure occurs in the center, but with the speed increasing, pressure rises slightly.
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