Abstract:A method of designing multilayers with broadband wavelength responses for use as coatings in EUV optics at normal incidence is presented in this paper. The method is based on the well-known Fresnel equations and recursive calculation combined with a defined merit function, with random variation of the thickness of each layer. This allows the design of multilayers for specific requirements. The method was used to design Mo/Si multilayers with broadband wavelength responses for the EUV region, 18-20nm. Such mirrors were made by magnetron sputtering in 99.99% pure argon. The deposition rates, after calibration, were 0.12 nm s(-1) for molybdenum and 0.07 nm s(-1) for silicon. The broadband multilayers were deposited on 30 mm diameter K9 glass substrates with rms surface roughnesses less than 0.8 nm. For comparison, reference periodic multilayers with working wavelength of 19 nm were also deposited. X-ray reflectivity and diffraction measurements were made in theta -2 theta geometry using a D/Max-B X-ray diffractometer and Cu K alpha radiation. The results show that broadband and periodic multilayer mirrors have different performances which matched with simulation calculations. Ln order to improve the making technique, the combination of Rutherford backscattering spectroscopy with X-ray low-angle diffraction were used. We have also developed the equipment that can measure reflectivity qualitatively using a transmission grating spectrograph because of no reflectometer. The results showed that the wavelength responses of broadband multilayers were broader and the integrated reflectivities were higher than for periodic multilayers, but that the peak reflectivity was slightly lower.

Multilayers for the EUV and Soft X-ray Region

Research of Multilayers in EUV, Soft X-ray and X-ray

Current Research Activities in the Field of Multilayer for EUV, Soft X-Ray and X-Rays in IPOE

DESIGN AND FABRICATION OF VISIBLE+1.54μm LASER/LONGWAVE INFRARED DICHROIC BEAMSPLITTER

Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors

Fabrication of the Beam Splitters with Large Area for Soft X-ray Laser Applications

Development of Multilayer Optics for the EUV, Soft X-ray and X-ray Regions in Tongji University

Development of Multilayer Optics in EUV, Soft X-Ray and X-Ray Range at IPOE

The Design, Fabrication and Characterization of Broadband Multilayer Mirrors for Euv Optics at Normal Incidence

Multilayer Beam Splitter Used in a Soft X-ray Mach-Zehnder Interferometer at Working Wavelength of 13.9 Nm

Broad Angular Multilayer Analyzer for Soft X-rays

Narrow-band Si/Mo/C Multilayer Mirrors Working at 13 Nm

Broadband aperiodic Mo/Si multilayer polarization elements for EUV region

Investigation in the Interface Roughness of DC-sputtered Mo/B4C Multilayer Mirrors with Variable Layer Pairs for 7-Nm Soft X-ray Polarizers

Multilayer Optics in Extreme Ultraviolet and Soft X- Ray Range

Broadband multilayer polarizers for the extreme ultraviolet

Fabrication of the Beam Splitters for Soft X-ray Laser Application

Development of MoSi2/Si lamellar multilayer grating for the narrowband soft x-ray monochromator

The Design and Fabrication of Multilayer Mirrors in EUV Region

Structure and Extreme Ultraviolet Performance of Si/C Multilayers Deposited under Different Working Pressures

Applications of Multilayer Optics