The Design and Fabrication of Multilayer Mirrors in EUV Region

赵伟,袁宏韬,缪同群
DOI: https://doi.org/10.3321/j.issn:1002-1582.2008.03.045
2008-01-01
Abstract:Researching in EUV multilayer used for the solar EUV imaging telescope are presented.The integrated reflectivity performance and the width of the band of the quarter-wavelength multilayer can be enhanced further by needle optimization procedures with which the layer thickness is deviated from the periodic stack with the software TFCALC.The Mo/Si coatings are deposited by using the dual ion beam sputtering technique.The reflectivity performances of the coatings are tested by using the synchrotron radiation reflectometer.The results demonstrate that the peak reflectivity is up to 27.5% and the requirements of the reflectors are preliminary met.
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