The Influence of Bi on the Exchange Bias Field of NiFe/FeMn Bilayers and the XPS Analysis

LI Ming-hua,YU Guang-hua,ZHU Feng-wu,ZENG De-chang,LAI Wu-yan
DOI: https://doi.org/10.3321/j.issn:1001-9731.2005.12.006
2005-01-01
Abstract:Experimental results show that Cu atoms can segregate to the NiFe surface in Ta/Cu/NiFe/FeMn/Ta films.This segregation results in a decrease of the exchange bias field(Hex) of NiFe/FeMn.In order to suppress the Cu surface segregation,we deposited Bi insetting layers at the interface of Cu and NiFe in Ta/Cu/NiFe/FeMn/Ta films.We found that the Hex of NiFe/FeMn can be doubled when the proper Bi was deposited.XPS analysis shows that Bi insetting layers deposited at the interface of Cu/NiFe effectively suppress the Cu segregation on the NiFe surface.As a result,the Hex was increased.
What problem does this paper attempt to address?