Preliminary Results on X-Ray Lithography Using A Compact Plasma Focus

S Lee,X Feng,GX Zhang,P Lee,MH Liu,A Serban,SV Springham,TKS Wong,K Wira,C Selvam,A Thang
DOI: https://doi.org/10.1109/plasma.2004.1339754
2004-01-01
Abstract:A 1.8kJ compact plasma focus source operated in neon is demonstrated as an x-ray source for microlithography in the wavelength range of 0.8-1.4 nm. Lithographs are obtained by exposing the resist to the x-ray point source with a mask in contact with the resist. The total energy emitted is measured using PIN diodes and photoconducting diamond detectors to be 15J per shot with a spectrum peaked at 1keV corresponding to the K shell lines from the neon working gas. The maximum repetition rate of 20 Hz allows lithographs to be obtained in less than 20 seconds when a reasonably sensitive resist is used.
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