Abstract:This work reports the structural effects on the focusing and imaging efficiency of 20–30 nm‐resolution zone plates at Diamond Light Source and Shanghai Synchrotron Radiation Facility. The zone width and the duty cycle were optimized using a modified beam‐propagation method for peak efficiency, and the effect of residual resist was also explored using simulation and experimental measurements.Hard X‐ray microscopes with 20–30 nm spatial resolution ranges are an advanced tool for the inspection of materials at the nanoscale. However, the limited efficiency of the focusing optics, for example, a Fresnel zone plate (ZP) lens, can significantly reduce the power of a nanoprobe. Despite several reports on ZP lenses that focus hard X‐rays with 20 nm resolution – mainly constructed by zone‐doubling techniques – a systematic investigation into the limiting factors has not been reported. We report the structural effects on the focusing and imaging efficiency of 20–30 nm‐resolution ZPs, employing a modified beam‐propagation method. The zone width and the duty cycle (zone width/ring pitch) were optimized to achieve maximum efficiency, and a comparative analysis of the zone materials was conducted. The optimized zone structures were used in the fabrication of Pt‐hydrogen silsesquioxane (HSQ) ZPs. The highest focusing efficiency of the Pt‐HSQ‐ZP with a resolution of 30 nm was 10% at 7 keV and >5% in the range 6–10 keV, whereas the highest efficiency of the Pt‐HSQ‐ZP with a resolution of 20 nm was realized at 7 keV with an efficiency of 7.6%. Optical characterization conducted at X‐ray beamlines demonstrated significant enhancement of the focusing and imaging efficiency in a broader range of hard X‐rays from 5 keV to 10 keV, demonstrating the potential application in hard X‐ray focusing and imaging.

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