The Effect of Oxygen Pressure on the Dielectric Properties of Pulsed Laser Deposited La-Doped Pbtio3 Thin Film

DZ Hu,MR Shen
DOI: https://doi.org/10.7498/aps.53.4405
IF: 0.906
2004-01-01
Acta Physica Sinica
Abstract:Pb0.72La0.28TiO3(PLT28) thin films have been prepared on Pt/Ti/SiO2/Si substrates by pulsed laser deposition under various oxygen pressure. Experimental study indicated that the oxygen pressure exerts a strong impact on the microstructure and the dielectric properties of the thin films. The film deposited under an oxygen pressure of 2 Pa had a larger dielectric constant and kept a low dielectric loss. At 10 kHz frequency, the dielectric constant was approximately 852 and the dielectric loss was 0.0110. Meanwhile, we found that other La-modified PbTiO3 films have the same relation between dielectric constant and pressure as the above. Possible explanation is given for this.
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