Design and Construction of an Ultrahigh Vacuum Evaporation Equipment for Atom Photolithography

陈献忠,姚汉民,陈旭南,李展,陈元培,高洪涛,石建平
DOI: https://doi.org/10.3969/j.issn.1003-501x.2004.01.002
2004-01-01
Abstract:Atom photolithography is a new application of atom optics in microfabriaction technical field. An ultrahigh vacuum evaporation equipment used for atom photolithography is designed and constructed. Its main parameters are : limit vacuum and operating vacuum 2.0E-6 Pa and 1.0E-5 Pa, respectively, the temperature of atom source tunable within a range of 300~1850 degree Celsius. Initial operation results show that limit vacuum of the equipment is better than the design parameter and its temperature is continuously tunable.
What problem does this paper attempt to address?