Drive current scaling properties of GOI pmosfet in nano-scale

Gang Du,Xiaoyan Liu,Zhiliang Xia,Danqiong Hou,Kang Jin-Feng,Ruqi Han
2004-01-01
Abstract:Characteristics of p-channel GOI MOSFETs with gate length (Lg) ranging 20nm-130nm are simulated by a 2D self-consistent full-band MC device simulator. The drive current scaling properties are investigated. The results indicate that p channel GOI MOSFETs have favorable scaling properties in nano-scale due to the non-stationary transport near source side. But the surface roughness scattering is a critical issue that might suppress the non-stationary transport.
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