Mist CVD Growth of ZnO-Based Thin Films and Nanostructures
Toshiyuki Kawaharamura,Hiroyuki Nishinaka,Yudai Kamaka,Yoshio Masuda,Jian-Guo Lu,Shizuo Fujita
DOI: https://doi.org/10.3938/jkps.53.2976
2008-01-01
Journal of the Korean Physical Society
Abstract:As a safe, simple, environmental-friendly, and cost-effective growth technique of oxide materials, we have developed the mist chemical vapor deposition method. To grow ZnO, a water and/or alcohol solution of zinc-compounds (for example, zinc acetate) is used as the source, and micron-sized aerosol or mist particles formed by ultrasonic atomization are supplied to the reaction area with a carrier gas. The ZnO thin films grown on glass substrates exhibited c-axis orientation under the selected growth conditions. The transparency in the visible region was higher than 90 %, the room temperature photoluminescence showed near band edge emission without noticeable deep level emissions, and the surface root-mean-square roughness was 7.5 nm despite the polycrystalline structure. These results are satisfactory for optical applications. The minimum resistivity, however, by gallium doping was 1.1 x 10(-3) ohm cm, which needs further progress by enlarging the grain size. The growth of other oxide thin films, for example, MgO and CdO, as well as ZnO nanorods was reported, suggesting potential of wide applications of this growth technique to various oxide thin films and nanostructures with the friendliness to environment.