Effects of Integration Processes on the Ferroelectric Performance of SrBi/sub 2/ta/sub 2/o/sub 9/ Capacitors

ZG Zhang,J Zhu,D Xie,ZH Liu
DOI: https://doi.org/10.1109/icsict.2004.1435110
2004-01-01
Abstract:The ferroelectric properties of integrated Pt/ SrBi2Ta2O9/Pt capacitors by insulator layer deposition and contact photo etching were investigated. Integration processes, especially the introduced ions and electrons play an important role for the degradation of SBT capacitors. After insulator layer deposition and contact photo etching, a significant reduction in polarization was observed, and this reduction can be recovered well by, recovery annealing in oxygen. The experimental result demonstrates that the integration processes can produce the ions, electrons and other defects, which has an obvious effect on the polarization of SBT capacitors. Also, the introduced defects can affect the leakage current and retention behavior.
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