Oxidation of Sic and Decomposition of Sio2 at Low Partial Pressure of Oxygen in He-O-2 System

ZQ Fu,CH Tang,TX Liang,JC Robin
DOI: https://doi.org/10.1016/j.nucengdes.2004.08.001
IF: 1.7
2004-01-01
Nuclear Engineering and Design
Abstract:The critical temperature of passive oxidation for SiC and the critical temperature of decomposition for SiO2 are very important for the application of SiC and SiC/SiO2 coatings. Through thermodynamic analysis, it is found that the influence factor controlling the critical temperature of passive oxidation for SiC in He-O-2 is the partial pressure of oxygen, and the critical temperature increases with the partial pressure of oxygen. The critical temperature of decomposition for SiO2 in He-O-2 is influenced by the partial pressure of oxygen and the amount of oxygen per mole SiO2, and this critical temperature increases with the partial pressure of oxygen, while it decreases with the amount of oxygen. SiC/SiO2 coating is more suitable than SiC coating for the improvement of the oxidation resistance of graphite at low partial pressure of oxygen in He-O-2 system. (C) 2004 Elsevier B.V. All rights reserved.
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