Investigation on Surface of p-GaN

薛松,韩彦军,郭文平,孙长征,郝智彪,罗毅
DOI: https://doi.org/10.3321/j.issn:0253-4177.2003.12.010
2003-01-01
Abstract:The surface condition of p-type gallium nitride (p-GaN) is investigated by X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). Current voltage measurement is utilized to show the I-V characteristics of Ni/Au contacts on the p-GaN. It is shown that removing oxide and carbon impurity and decreasing the atomic ratio of gallium over nitride (Ga/N) on the p-GaN surface results in improving the ohmic contacts.
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