Research on P-Type GaN / Au Ohmic Contact

CHENG Cai-jing,SI Jun-jie,LU Zheng-xiong,ZHAO Hong-yan,ZHAO Lan,DING Jia-xin,SUN Wei-guo,CHEN Zhi-zhong,ZHANG Guo-yi
DOI: https://doi.org/10.3969/j.issn.1672-8785.2006.08.006
2006-01-01
Abstract:The contact resistance of the p-type GaN/Au Ohmic contact was studied.After treating the surface by using the boiling aqua regia,the Ohmic contact with a contact resistivity of 0.045Ω.cm~2 could be directly formed.The tests for the contact resistance and current-voltage(Ⅰ-Ⅴ)characteristics had shown that the contact resistivity of the p-type GaN/Au sample would be changed after it was annealed in the N_2 ambient gas.The sample had its least contact resistivity of 0.034Ω·cm~2 after annealing at 700℃for 5 minutes and had its linearⅠ-Ⅴcharacteristic curve after annealing at 900℃for 5 minutes.The analysis result had shown that the change of the contact resistivity of the p-GaN/Au sample was mainly attributed to the increase of the contact area between AU and p-type GaN after annealing at 700℃and the diffusion of the nitrogen at the p-type surface into the Au layer after annealing at 900℃.
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