Abstract:Zinc oxide (ZnO) films with thicknesses from (9.1 +/- 0.7) to (145 +/- 7) nm were deposited on silicon substrates by ion-assisted electron beam evaporation (EBE), and transformed to a highly (110)-oriented non-polar phase through thermal treatment at temperatures of 300, 500, and 700 degrees C. The structural, morphological and optical properties of the ZnO thin films were systematically characterized using transmission electron microscopy (TEM), X-ray diffraction (XRD), atomic force microscopy (AFM), spectroscopic ellipsometry (SE), and photoluminescence (PL). The XRD and AFM results illustrate that the deposited ZnO films evolved from an X-ray amorphous structure to the polycrystalline hexagonal wurtzite structure with increasing thickness and experienced a crystallographic plane improvement from (102) to the (110) non-polar phase during annealing. The dielectric functions of the whole layer are mainly affected by the dielectric responses near the surface of ZnO nanocrystals and show an upward trend with nanocrystal growth, induced by thickness and annealing temperature. The optical band gaps were also investigated and correlated with the structural properties. In the PL spectra, a strong ultraviolet luminescence (UVL) band and a weak visible green luminescence (GL) band were observed. The intensity ratio of UVL and GL-associated with crystal quality-agrees with the results acquired from other measurements. The two determinants for highly (110)-oriented non-polar ZnO films are the suppression of growth in the (002) direction by ion bombardment and the promotion of the (110) plane induced by diffusion energy during annealing. (C) 2017 Elsevier B.V. All rights reserved.

ZnO Films Synthesized by Solid-Source Chemical Vapor Deposition with c-Axis Parallel to Substrate

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

Zno-based Thin Films Synthesized by Atmospheric Pressure Mist Chemical Vapor Deposition

Synthesis and Properties of ZnO Films with (1 0 0) Orientation by SS-CVD

Mist CVD Growth of ZnO-Based Thin Films and Nanostructures

Fabrication of Transparent ZnO Thick Film with Unusual Orientation by the Chemical Bath Deposition

Hetero-Growth Of (100) Orientated Zno Films On Silicon By Ss-Cvd

Preparation and Properties of N-Doped P-Type ZnO Films by Solid-Source Chemical Vapour Deposition with the C -Axis Parallel to the Substrate

Structural, optical and electrical properties of ZnO thin films prepared by reactive deposition

Structural and Optical Properties of Highly (110)-Oriented Non-Polar ZnO Evaporated Films on Si Substrates

Structural, electrical and optical properties of N-doped ZnO films synthesized by SS-CVD

Synthesis of Well-aligned ZnO Nanowires Using Simple Physical Vapor Deposition Without Catalysts or Additives

Low-Temperature C-Axis Oriented Growth of Nanocrystalline Zno Thin Films on Si Substrates by Plasma Assisted Pulsed Laser Deposition

On the formation of well-aligned ZnO nanowall networks by catalyst-free thermal evaporation method

Facile synthesis of ZnO films with anisotropic preferred orientations: An effective strategy for controllable surface and optical property

Zno Thin Film Grown on Silicon by Metal-Organic Chemical Vapor Deposition

Structural and optical properties of a-plane ZnO thin films synthesized on γ-LiAlO2 (302) substrates by low pressure metal-organic chemical vapor deposition

Structural and Optical Characterizations of ZnO Films Grown by Reactive Electron Beam Evaporation

Preparation of C-Axis Oriented ZnO Optical Waveguiding Films on Fused Silica by Pulsed Laser Reactive Ablation

B23-O-15 Van Der Waals Epitaxial Growth of Highly-textured ZnO Thin Film on Surface-modified Silicon Substrates by Chemical Bath Deposition

One-Step Synthesis of ZnO Films by Chemical Bath Deposition Not Using Thermal Annealing