A COMPUTATIONAL DESIGN OF Si-BASED DIRECT BAND-GAP MATERIALS

MC Huang,JL Zhang,HP Li,ZZ Zhu
DOI: https://doi.org/10.1142/s0217979202015261
2002-01-01
Abstract:A bulk silicon is an indirect band gap semiconductor, the radiative transitions in silicon involves a electron-hole-phonon three-body processes and is therefore making it an inability of light emission. In order to integrate Si-based microelectronics with optical components, a best solution is to design a Si-based material with direct band-gap. Here we suggest a new Si-based superlattice consists of a nano-silicon layer and a VI-atom monolayer with dimer-structures in the interfaces between silicon and VI-atom layers. The structural formula is VI/Si m / VI/Si m / VI , (m = 2n or/and 2n+1, n ≥ 3). A simple form of (2×1) surface reconstruction has been considered in the ab initio calculation of electronic structures for this Si-based superlattices system. It is found from our computational design that a Se/Si 10/ Se/Si 10/ Se superlattice has a direct band-gap at Γ point. As a kind of new Si-based materials, the important potential and advantages in optoelectronic applications will be discussed.
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