Work Function of Tungsten Carbide Thin Film Calculated Using Field Emission Microscopy

孙建平,张兆祥,侯士敏,张耿民,赵兴钰,刘惟敏,薛增泉
DOI: https://doi.org/10.3321/j.issn:0372-2112.2002.05.011
2002-01-01
Tien Tzu Hsueh Pao/Acta Electronica Sinica
Abstract:Under pressure of 1×10-6-10-5pa, a thin film of tungsten carbide is formed on the surface of tungsten tip of field emission microscopy after certain annealing treatment. Typical field emission patterns of tungsten carbide thin film is observed, and its I-V behavior and Fowler-Nordheim plot is measured. Using transmission electron microscopy, we measure the curvature radius of emission tip, and estimate the ratio factor β with an empirical formula, then calculate the work function ψ of tungsten carbide thin film to be 379eV according to Fowler-Nordheim formula.
What problem does this paper attempt to address?