STUDING ON ELECTROMAGNETIC CHARACTERS OF Fe/Al2O3/Fe TUNNE LING JUNCTIONS

CY Liu,QY Xu,G Ni,H Sang,YW Du
DOI: https://doi.org/10.7498/aps.49.1897
2000-01-01
Abstract:Using ion-beam-sputtering technique, Fe/Al2O3/Fe magnetic tunneling junctions (MTJ) were fabricated. Tunneling magnetoresistance (TMR) eff ect of MTJ samples has been successfully studied. The chemical composition and t he microstructural characteristics of hard-and soft-magnetic layers, insulating layer, and interface of MTJ were analyzed by X-ray photoelectron spectroscopy an d Atomic force microscopy. The dependence of MR effect on microstructure, chemic al composition, conductance, and I-V characteristic of the samples are also di scussed.
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