Diagnosis of dielectric barrier discharge CH4 plasmas for diamond-like carbon film deposition
Dongping Liu,Yong Xu,Xuefeng Yang,Shiji Yu,Qi Sun,Aimin Zhu,Tengcai Ma
DOI: https://doi.org/10.1016/S0925-9635(02)00050-X
IF: 3.806
2002-01-01
Diamond and Related Materials
Abstract:Dielectric barrier discharge (DBD) CH4 plasmas during diamond-like carbon (DLC) film deposition have been characterized in-situ by means of optical emission spectrometry (OES), the Langmuir double probe method and molecular beam mass spectrometry (MBMS). With a 1.4 kHz, 30-kV peak voltage DBD power source, while the Pd-value (the product of CH4 pressure P, and discharge gas spacing d) decreases from ∼14 to 4 torr mm, the measured electron temperature and the hydrogen atom excitation temperature of the CH4 plasmas rise from ∼3.0 to 5.8 eV, and from ∼6.3×103 to 7.8×103 K, respectively. The higher electron temperature and H excitation temperature of the plasmas at smaller Pd, imply the generation of more energetic ions in the plasma sheath near the film surface, that is confirmed by the MBMS observations. The MBMS experiments also show that the major ions near the coating are CH3+, CH2+, CH+ and C+, which are mainly produced through the collisions between fast CHx+ (x=1–4) and neutral CH4 molecules in the plasma sheath region.