Chemical etching of Ni-Ti SMA film

Guifu Ding,Dong Xu,Xiaolin Zhao,Shoubai Zhang,Bingchu Cai,Tianhui H. Shen
1999-01-01
Abstract:The patterning problem of Ni-Ti SMA (shape memory alloy) film is one of the main obstacles during the practical application of the film. An excellent chemical etchant was developed for obtaining the patterns with high precision. The etchant has stable performance and can be used at the etching rate of 1-5 μm/min with good etched lines. Common mask resist is very stable in the etchant. The etched patterns on the sputter-formed SMA film are exactly the same as mask patterns. The etched lines are smooth and straight. The etched surface is a bit rough when the etchant is used for the heat-treated film, So that it can only be used for etching relatively thick lines because the etching rates of crystals and crystal boundaries are different. The SMA microactuator which is patterned in the etchant can be used in the manufacture of micropump.
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