Photoluminescence of Ozone Oxidized and Hf Etched Porous Silicon and the Multiple Source Quantum Well Model

L Jia,SP Wong,IH Wilson,SK Hark,SL Zhang,ZF Liu,SM Cai
DOI: https://doi.org/10.1063/1.119902
IF: 4
1997-01-01
Applied Physics Letters
Abstract:Porous silicon (PS) samples were alternately oxidized in an ozone atmosphere and etched in HF solution. The variation of the corresponding photoluminescence (PL) implies that there is more than one origin responsible for the PL of PS. These results are explained by a multiple source quantum well model, where the nanoscale Si units and their covering oxide layers both contribute to the PL in different situations.
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