Abstract:Textured LixNi2-xO (LNO) thin films have been fabricated on (001)MgO substrates by pulsed laser deposition technique. The as-deposited LNO films shows a conductivity of 2.5×10-3 Ω m and possess a transmittance of about 35% in the visible region. Subsequent deposition of Sr0.6Ba0.4Nb2O6 (SBN60) thin film on these LNO-coated MgO substrates resulted in a textured SBN layer with a 〈001〉 orientation perpendicular to the substrate plane. Phi scans on the (221) plane of the SBN layer indicated that the films have two in-plane orientations with respect to the substrate. The SBN unit cells were rotated in the plane of the film by ± 8.2° as well as ± 45° with respect to the LNO/MgO substrate. Besides the highly (00l)-orientation, the SBN films also exhibited a dense microstructure as shown by scanning electron microscopy. The electro-optic coefficient (r33) of the SBN film was measured to be 186 pm/V. On the basis of our results, we have demonstrated that the LNO film can be used as a buffer layer as well as a transparent bottom electrode for waveguide applications. The SBN/LNO heterostructure is also a suitable candidate for integrated electro-optics devices.

Pulsed laser deposition of SrxBa1-xNb2O6/MgO bilayered films on Si wafer in waveguide form

Pulsed Laser Deposition of /mgo Bilayered Films on Si Wafer in Waveguide Form

SrxBa1-xNb2O6 optical waveguiding thin films on SiO2 coated Si(100) substrates

Electro-optic Properties of Epitaxial Sr0.6Ba0.4Nb2O6 Films Grown on MgO Substrates Using LixNi2-xO Buffer Layer

Ferroelectric SrxBa1-xNb2O6 optical waveguiding thin films on SiO2-coated Si(100) substrates

Pulsed Laser Deposition of C-Oriented Optical Waveguiding Bilayered Films on Silicon Wafers

Measurement of transverse electro-optic coefficient of Sr 0.6Ba0.4Nb2O6 thin film grown on MgO substrate with different content of potassium ions

Pulsed laser deposition of c-orientedLiNbO3LiTaO3 optical waveguiding bilayered films on silicon wafers

Fabrication and Characteristics of Sr0.6ba0.4nb2o6 Films Prepared by Pulse Laser Deposition

Pulsed Laser Deposition of Optical Waveguiding LiNbO 3 Films on SiO 2 Substrate

Prepared by PLD and Optical Properties of Sr_(0.75)Ba_(0.25)Nb_2O_6 Thin Films

(012) Textured LiNbO3 Waveguiding Films Grown on SiO2 by Pulsed Laser Deposition Technique

PULSED LASER DEPOSITION OF OPTICAL WAVEGUIDING STRONTIUM BARIUM NIOBATE FILMS

Investigation on and preparation of the barium sodium niobate optical-waveguide films by pulsed laser deposition (PLD) technique

In-situ Poling of Lithium Niobate Films on Silicon Wafer by Applying a Low Electric Field During Pulsed Laser Deposition

Cubic MgxZn1−xO Films Grown on SiO2 Substrates

Growth of ferroelectric (K0.5Na0.5)0.2(Sr0.75Ba0.25)0.9Nb2O6 thin films by fulsed laser deposition

Heteroepitaxial growth of Sr1.8Ca0.2NaNb5O15/Li0.25Ni0.75O/MgO by pulsed laser deposition

The role of SiO2 buffer layer in the growth of highly textured LiNbO3 thin film upon SiO2/Si by pulsed laser deposition

Highly C-Axis Oriented LiNbO3 Thin Film Grown on SiO2/Si Substrates by Pulsed Laser Deposition

Pulsed Laser Deposition of Linbo3/Litao3 Multilayer Films on Sio2/Si(100) Substrate