Abstract:Large-size diffraction gratings are essential for pulse compressors in chirped-pulse-amplified high-power laser systems, spectroscopic telescopes, etc. Fabricating large gratings requires large-aperture laser beams with collimated and aberration-free wavefronts. As an alternative a method of making monolithic gratings by optical mosaic has been proposed, which makes multiple-exposures in different areas of a substrate to enlarge the grating size. Between exposures the position and attitude of substrate must be adjusted to minimize the overall wavefront errors, with very tight accuracy requirements (similar to dozens of nanometers and tenths of micro-radians, respectively).We fully utilize the latent fringes (exposed but undeveloped fringes in photoresist) as the core reference object and the exposure beams as the adjustment beams to adjust and lock the position and attitude between consecutive exposures. This approach greatly simplifies the alignment system and eliminates many system errors. However, the diffraction efficiency of a latent grating is extremely weak (similar to 10(-5)) and excessive exposure of the latent fringes during the position and attitude adjustment should be avoided. We overcome these difficulties by carefully blocking stray lights and using a high-sensitivity CCD to monitor the interference fringes of the -1st- and 0th-order latent-fringe diffracted wavefronts. Experimentally we have made 2 x 2 mosaics of (60+28) x (53+30) mm(2) grating area. Typical peak-valley and root-mean-square values of the measured -1st-order diffraction wavefront errors are 0.06 lambda and 0.01 lambda, respectively.The mosaic conditions, detailed alignment steps, and experimental results showing position and attitude controllability will be presented. Important issues of extending the present work to large-size (possibly sub-meter) fabrication will also be discussed.

Study of Deep-etched Glass Waveguide Grating

Design and fabrication of 1 × 32 silica-based arrayed waveguide grating

Fabrication of UV Transmission Blazed Gratings by Holography-Ion Beam Etching

Fabrication of Large Grating by Monitoring the Latent Fringe Pattern

Fabrication of a New Type of Transmission Grating with Holography Interferometry and Wet Anisotropic Etching

Laser Fabrication of Photorefractive Bragg Reflectors, Asymmetric Waveguides and Void Arrays in Glass

VUV and Soft X-Ray Diffraction Grating Fabrication by Holographic Ion Beam Etching

Inscribing Diffraction Grating by Femtosecond Laser Ablation of Metal Film on Glass Substrate

High-Efficiency Multilayer-Coated Ion-Beam-Etched Blazed Grating in the Extreme-Ultraviolet Wavelength Region

Holographic Fabrication of Multiple Layers of Grating Inside Soda–lime Glass with Femtosecond Laser Pulses

Femtosecond laser direct writing of multiwavelength Bragg grating waveguides in glass

Fabrication of Optical Mosaic Gratings by Consecutive Holographic Exposures Employing A Latent-Fringe Based Alignment Technique

Vacuum-ultraviolet blazed silicon grating anisotropically etched in KOH solution

Fabrication of echelette gratings by reactive ion beam etching of native substrate grating mask

Fabrication of Slanted Grating Utilizing Reaction Ion Beam Etching: The Role of CHF<inf>3</inf> and O<inf>2</inf> Etching Atmosphere

Fabrication of large UV transmission blazed gratings for slitless spectral sky survey

Design and fabrication of soft x-ray blazed diffraction gratings

The Manufacture of a Binary Optic Liquid Crystal Blazed Grating and Its Electro-Optical Properties

In-fiber Polymer-Glass Hybrid Waveguide Bragg Grating.

Deep InP Gratings for Opto-Electronic Devices Etched by Cl <sub>2</sub> /CH <sub>4</sub> /Ar Inductively Coupled Plasma

Imprinting Gradient Refractive Index Micro-Structure in GeS2–Ga2S3–KCl Glass for Broadband Diffraction Grating