Abstract:The enhancement of laser damage resistance of fused silica optics was a hotspot in scientific research. At present, a variety of modern processes have been produced to improve the laser induced damage threshold (LIDT) of fused silica optics. They included pre-treatment processes represented by flexible computer controlled optical surfacing (CCOS), magnetorheological finishing (MRF), ion beam finishing (IBF), and post-treatment processes represented by dynamic chemical etching (DCE). These have achieved remarkable results. However, there are still some problems that need to be solved urgently, such as excessive material removal, surface accuracy fluctuation in the DCE process, and the pollution in MRF process, etc. In view of above problems, an MRF, CCOS, IBF and shallow DCE combined technique was used to process fused silica optics. The surface morphology could be greatly controlled and chemical etching depth was reduced, while the LIDT increased steadily. After processing by this combined technique, the LIDT increased to 12.1 J/cm2 and the laser damage resistance properties of fused silica were significantly enhanced. In general, the MRF, IBF, CCOS and shallow DCE combined technique brought much help to the enhancement of laser damage resistance of fused silica, and could be used as a process route in the manufacturing process of fused silica.

On the diffusion of C60 in the porous silica glass and its optical limiting effect

Optical limiting effect of SiO2 gel containing C60

Sol-Gel Derived Hybrid Materials Containing C-60 and Their Optical Limiting Effects

Sol-Gel Derived Ormosil Doped With A C-60-Derivative And Its Optical Limiting Effects

C-60 Induced Photoluminescence of A Silica Molecular Sieve

Preparation of C60-doped Silica Aerogels and the Study of Photoluminescence Properties

The Effects of Microstructure on Optical and Thermal Properties of Porous Silica Films

Tuning the peak position of subwavelength silica nanosphere broadband antireflection coatings.

Optical limiting properties of buckminsterfullerene C60/C70

Optical Limiting Response of Porous Carbon Dispersions

Study on 532nm and CO2 laser processing of fused silica glass

Luminescence spectra of C60 molecules embedded in porous Si

Study of reverse saturable absorption of C60 with incompletely self-mode-locked laser

Self-Diffraction and Optical Limiting Properties of Palladium-Octaisopentyloxy-Phythalocyanine-Doped Ormosil

Photoluminescence properties of C60-doped silica aerogel

Enhanced Optical Limiting Performance of a Novel Molybdenum Complex of Fullerene

PREPARATION OF FULLERENCE DOPED SILICA AEROGELS AND THE STUDY OF PHOTOLUMINESCENCE PROPERTIES

Study on the Absorption Characteristics and Laser Damage Properties of Fused Silica Optics under Flexible Polishing and Shallow DCE Process

Preparation and Optical Properties of Cui Microcrystal Doped Silicate Glasses

Photoluminescence From C-60-Coupled Porous Structures Formed On Fe+-Implanted Silicon

Different Effects of Laser on C60 Adsorbed on the Si (111)7 × 7 and Si (100) 2 × 1 Surfaces