A unified model of metallic filament growth dynamics for conductive-bridge random access memory (CBRAM)

Shengjun Qin,Jinyu Zhang,Zhiping Yu
DOI: https://doi.org/10.1109/SISPAD.2013.6650645
2013-01-01
Abstract:A unified model is developed for the first time to explain the metallic filament growth from either anode or cathode for conductive-bridge random access memory (CBRAM). Both electrochemical reactions and ion/electron transport are considered. Simulation results reveal that diffusion coefficient and mobility of cations in the electrolyte are responsible for determining the growth direction of the conductive metallic-filament. The simulation results for the forming process of CBRAM are compared to experimental data and good agreement is achieved.
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