Three-dimensional micro- and nanometre composite aluminium patterns
Zhao Xiao-Wei,Peng Jiang,Yan Gao,Wang Jian-Xiong,Li Song,Liu Dong-Fang,Liu Li-Feng,Dou Xin-Yuan,Luo Shu-Dong,Zhang Zeng-Xing,Xiang Yan-Juan,Zhou Wei-Ya,Gang Wang,赵小伟,江鹏,高燕,王健雄,宋礼,刘东方,刘利峰,窦新元,罗述东,张增星,XW Zhao,JX Wang,DF Liu,LF Liu,XY Dou,SD Luo,ZX Zhang,YJ Xiang,WY Zhou
DOI: https://doi.org/10.1088/1009-1963/14/7/036
2005-01-01
Chinese Physics
Abstract:Three-dimensional micro- and nanometre composite aluminium patterns are constructed on Al substrate by using photolithography, reactive ion etching and anodization. A layer of patterned SiO2 Mask is introduced as resist on the surface of Al foil, and during anodization the tilted nanopores and remaining Al microstructure are formed underneath the SiO2 mask. The existence of SiO2 mask leads to the deflection of electric field and effect on the transportation of ions, which results in the formation of laterally tilted nanopores, while the nanopores go down directly when being far from the boundaries of SiO2. The vertical and lateral anodization processes proceeding simultaneously construct the Al microstructure under the patterned SiO2 mask.