A Self-Aligned Mask-Free Fabrication Process for High-Frequency ZnO Array Transducer

J. Y. Zhang,W. J. Xu,J. Carlier,E. Moulin,D. Remiens,X. M. Ji,Y. P. Huang,S. M. Chen
DOI: https://doi.org/10.1109/ultsym.2012.0453
2012-01-01
Abstract:High-frequency ultrasonic array transducers are essential for high resolution imaging in clinical analysis and Non Destructive Evaluation (NDE). However, the fabrication of piezoelectric array transducers is a great challenge due to the small features in elaborating piezoelectric array films. This paper describes a MEMS based self-aligned mask-free process for fabrication of ZnO linear array transducers of more than 100MHz. A four-step-rotation deposition approach is proposed and investigated, that improves the lateral growth in ZnO array deposition. The ratio of vertical to lateral growth is improved by 40% compared to one-step deposition method. The results prove that the reduction of the lateral growth helps to achieve full-kerfed ZnO array with smaller pitch.
What problem does this paper attempt to address?