Abstract:Titanium dioxide films were deposited on silicon substrates from oxygen/titanium tetraisopropoxide inductively coupled radiofrequency plasmas in a helicon reactor operated at low temperature (<150°C) and low pressure (0.4Pa). The effect of the ion energy (Ei), varied in the 15–175eV range, on the morphology, microstructure and optical properties of the films is investigated. Scanning electron microscopy (SEM) shows that at low energy (Ei=15eV), the film exhibits a columnar morphology consisting of a bottom dense layer, an intermediate gradient layer and a top roughness layer. Increasing the ion energy results in more homogeneous films along the growth direction as confirmed by the in-situ kinetic ellipsometry measurements and post deposition spectroscopic ellipsometry data analysis. In addition, the atomic force microscopy (AFM) measurements reveal that the film top surface becomes smoother as Ei is increased. X-ray diffraction (XRD) diagrams show that only anatase is identified in the film deposited at 15eV, whereas the complete phase transformation from anatase to rutile occurs at Ei=75eV. These results are in good agreement with the Fourier transform infrared spectroscopy (FTIR) spectra which also show that the hydroxyl groups absorbed in the films deposited at 15eV, are greatly decreased for Ei≥45eV. Suitable structural models combined with the Tauc–Lorentz dispersion law have been found to accurately fit the spectroscopic ellipsometry experimental data. The results in good agreement with SEM and AFM measurements are also consistent with the structural properties evidenced by XRD and FTIR. The refractive index (n) can be increased significantly by increasing the ion energy from 15eV to 75eV, reaching a value of 2.49 at 1.96eV. Upon increasing the ion energy above 75eV n is shown to decrease due to micropores which are formed in the films.

Optical Properties of Anatase TiO2 Films Modified by N Ion Implantation

Effect of N-Doping on Absorption and Luminescence of Anatase Tio2 Films

Microstructures and Properties of N-Doped TiO_2 Films Grown by Atmospheric Pressure Chemical Vapor Deposition

N-Tio2 Nanoparticles Embedded in Silica Prepared by Ti Ion Implantation and Annealing in Nitrogen

Investigation of structure and properties of N-doped TiO2 thin films grown by APCVD

Microstructures and Properties of N-Doped TiO_2 Films Grown by Dielectric Barrier Discharge Chemical Vapor Deposition

Study of optical and electrical properties of TiN thin films prepared by cathodic ion sputtering

Structure and Properties of Nitrogen-Doped Titanium Dioxide Thin Films Grown by Atmospheric Pressure Chemical Vapor Deposition

Preparation and Properties of N-doped TiO_2 Films by APCVD

Improved Optical Response and Photocatalysis for N-doped Titanium Oxide (tio2) Films Prepared by Oxidation of TiN

Investigation of microstructure evolution in Pt-doped TiO2 thin films deposited by rf magnetron sputtering

Electronic and Optical Properties of Anatase and Rutile Tio2:Nb

Photoelectrochemical and Optical Properties of N-doped TiO2 Thin Films Prepared by Oxidation of Sputtered TiNx Films

Effect of ion bombardment on the structural and optical properties of TiO 2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma

A study on the Raman response of TiO2 upon ion-implantation and annealing in O2 atmosphere

Structure and Properties of Tio2 Films Prepared by Ion Beam Assisted Deposition

Characteristics of N-Doped Tio2 Thin Films Grown on Unheated Glass Substrate by Inductively Coupled Plasma Assisted Dc Reactive Magnetron Sputtering

Anatase Tio2 Films with Dominant {001} Facets Fabricated by Direct-Current Reactive Magnetron Sputtering at Room Temperature: Oxygen Defects and Enhanced Visible-Light Photocatalytic Behaviors

Optical Properties of TiO2 Film after Annealing in Nitrogen

Improvement of Optical Reactivity for Nano-Tio2 Film by Nitrogen Ecr Plasma

Characterization of Cr–N Codoped Anatase TiO2(001) Thin Films Epitaxially Grown on SrTiO3(001) Substrate