Design and Experimental Study of Deposition Temperature Control System in Ultra-High Vacuum

Zhi Dan Yan,Li Dong Sun,Chun Guang Hu,Xiao Tang Hu,Peter Zeppenfeld
DOI: https://doi.org/10.4028/www.scientific.net/amr.571.564
2012-01-01
Advanced Materials Research
Abstract:Deposition temperature is a key factor influencing the growth morphology of thin-films, aiming at this phenomenon, a precise control system of deposition temperature in ultra-high vacuum is developed in the paper. It can realize accurate temperature control in a range of 150K to 450K during experiment by combination of resistance heating up and liquid helium cooling down strategies, which is benefit to further understand the temperature-depended mechanism of organic molecule thin-film growth. Besides, it is experimentally studied that the growth morphology of p-6p molecules on a mica substrate is closely related to the substrate deposition temperature, indicating that the length of p-6p nano-fibers is proportional to the deposition temperature, while their distribution density is inversely proportional to the temperature.
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