Enhanced Tunneling in the GaAs P+–n+junction by Embedding InAs Quantum Dots

Lijuan Wang,Jifang He,Xiangjun Shang,Mifeng Li,Ying Yu,Guowei Zha,Haiqiao Ni,Zhichuan Niu
DOI: https://doi.org/10.1088/0268-1242/27/11/115010
IF: 2.048
2012-01-01
Semiconductor Science and Technology
Abstract:GaAs p(+)-n(+) junctions with and without a layer of InAs quantum dots (QDs) embedded at the interface are discussed in this article. The current density versus voltage (I-V) characteristics show that the junctions without QDs are weak degenerate due to the Beryllium(Be) atoms diffusion of nominal p(++)-GaAs; the junctions with QDs generate enhanced tunneling current at forward bias, because the QDs layer reduces the Be diffusion and enables a two-step tunneling process. At room temperature, the current density of the sample with QDs is enhanced to 122 A cm(-2) at a forward bias of +0.32 V, which is about 2 orders of magnitude higher than the reference sample without QDs.
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