Abstract:ZnO thin films were prepared by radio frequency (RF) reactive magnetron sputtering at varying deposition conditions. The effects of RF power (from 40 to 90 W) and substrate temperature (from 100 to 200 degrees C) on the grain growth behavior, surface morphology evolution, and the structural and optical properties of the films were investigated. Atomic force microscopy (AFM) measurements confirmed that the grain size and surface roughness depend mainly on the RF power and increase with increasing it at the initial deposition stage of 5 s, and are strongly affected by the substrate temperature and increase with increasing it at the final deposition stage of 45 min. The influence of both the deposition parameters on the surface structure of the ZnO films at different deposition stages and the mechanism concerning this influence were discussed. The X-ray diffraction (XRD) and optical absorption spectra analysis indicated that all the films deposited for 45 min are in the state of the compressive stress and exhibit polycrystalline nature with the (002) preferential orientation, and they have high optical transparency in the visible range and sharp absorption edges around the wavelength 360 nm corresponding to the ZnO exciton. With the increase of the RF power and substrate temperature, the grain size increases, the residual compressive stress relaxes, and the optical band gaps broaden. In comparison with the RF power, the substrate temperature has more evident influence on the microstructure of the ZnO thin films.

Effects of deposition conditions on the structural and acoustic characteristics of (1120) ZnO thin films on R-sapphire substrates.

Effects Of Deposition Conditions On The Structural And Acoustic Characteristics Of (11(2)Over-Bar0) Zno Thin Films On R-Sapphire Substrates

Deposition of ZnO Films with C-Axes Lying in R-sapphire Substrate Planes

Fabrication and Characterization of Y2O3 Stabilized ZrO2 Films Deposited with Aerosol-Assisted MOCVD

Characteristics of Surface Acoustic Waves Excited by (1120) Zno Films Deposited on R-sapphire Substrates

The Effects of Oxygen Partial Pressure and Substrate Temperature on the Structural and Optical Properties of Zno Films

Microstructure and Optical Properties of ZnO Films Deposited by Radio-frequency Reactive Magnetron Sputtering

Effects of Sputtering Conditions on Properties of ZnO Films Prepared by RF Magnetron Sputtering for SAW Applications

Epitaxial Growth Of Zno On Gan/Sapphire Substrate By Radio-Frequency Magnetron Sputtering

Characteristics of surface acoustic waves in (11 2̅ 0)ZnO film/ R -sapphire substrate structures

Effect of Sapphire Substrate Pre-Treatment on the Growth of Zno Films

Deposition Condition Investigation of High c-axis Preferred Orientation ZnO Films Produced by RF Magnetron Sputtering

Growth of C-Axis Orientation ZnO Films on Polymer Substrates by Radio-Frequency Magnetron Sputtering

Crystalline Structure Effect on the Performance of Flexible ZnO/polyimide Surface Acoustic Wave Devices

Characteristics of surface acoustic waves in (11$$\bar 2$$ 0)ZnO film/ R-sapphire substrate structures

Preparation and Properties of High (002) Orientation ZnO-Li+ Films

Research of Deposition Condition and Structural Properties of ZnO Films Grown by RF Magnetron Sputtering

Characterization of ZnO thin films deposited on diamond-like carbon coated onto Si and SiO2/Si substrate

Structural evolution of ZnO films deposited by rf magnetron sputtering on glass substrate

Grain Growth Behavior, Surface Morphology Evolution, Structures, and Optical Properties of Zno Thin Films Prepared by Rf Reactive Magnetron Sputtering

Rutherford Backscattering and Optical Studies for Zno Thin Films on Sapphire Substrates Grown by Metalorganic Chemical Vapor Deposition