High-Resolution X-Ray Photoelectron Spectroscopy Study of Photo-Oxidation of Amorphous Oxy-Chalcogenide Films

Yinyao Liu,Himanshu Jain,Jing Ren,Qiqi Yan,Guorong Chen
DOI: https://doi.org/10.1021/jp3072712
2012-01-01
Abstract:Photobleaching (PB) of oxy-chalcogenide (O-Ch) films is investigated by in situ transmission spectra measurements and compared with GeSe2 films free of oxygen. The structural changes in the exposed O-Ch films are revealed by high resolution X-ray photoelectron spectroscopy. The laser illumination in air causes significant increase in the concentration of oxygen. The present results provide a direct evidence for the incorporation of oxygen in the glass network during irradiation and also indicate that photo oxidation is one of the causes for PB. The PB in O-CH films occurs as a consequence of photoreactions involving the breaking of Ge-Ge and Ge-Se bonds and formation of more stable Ge-O/Se-O bonds or fully oxidized GeO4 units of germanium oxide.
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