Electron Swarm Parameters in Sf6 and Krypton Gas Mixtures

DM Xiao,LL Zhu,XG Li
DOI: https://doi.org/10.1143/jjap.40.l203
2001-01-01
Abstract:The electron swarm growth processes in SF6-Kr gas mixtures have been studied using a pulsed Townsend method over the range 32.24≤E/N≤564.2Td(1Td=10-21V·m2), whereEis the electric field andNis the gas density of the mixture. The variation patterns as a function of the density-reduced electric field of the effective ionization coefficient α, electron drift velocityVeand longitudinal diffusion coefficientDLin SF6-Kr gas mixtures have been determined. The dielectric strength of SF6-Kr gas mixtures which varies linearly with the SF6concentration in the gas mixtures Has also been determined.
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