Transport Parameters of Electron Swarms in SF6 and Argon Gas Mixtures

Deng-Ming Xiao,Hong-Lei Li,Ya-Zhu Chen
DOI: https://doi.org/10.1143/JJAP.39.L244
2000-01-01
Abstract:The electron swarm growth processes in SF6-Ar gas mixtures have been studied by a pulsed Townsend method over the range 32.24 less than or equal to E/N less than or equal to 564.2 Td (1Td = 10(-21)V.m(2)); where E is the electric field and N is the gas density of the mixture. The variation patterns as functions of the density-reduced electric field of the effective ionization coefficient <(alpha)over bar>, electron drift velocity V-e and longitudinal diffusion coefficient D-L in SF6-Ar gas mixtures have been given. The dielectric strength of SF6-Ar gas mixtures has also been determined, and found to vary linearly with SF6 concentration in the gas mixtures.
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