Chemical vapour deposition of Si(OEt)4 on zeolite Hβ

Yuan Chun,Xin Chen,Ai-Zhen Yan,Qin-Hua Xu
DOI: https://doi.org/10.1016/S0167-2991(08)63639-3
1994-01-01
Abstract:Si(OEt) 4 was used to control the pore-opening size of Hβ zeolite in this paper. The factors affecting deposition extent of alkoxide have been measured. After deposition the CVD zeolite samples have been characterized by XRD, FTIR, NH 3 -TPD, isopropanol probe reaction and adsorption experiments of m-xylene, mesitylene and n-hexane. The results showed that the adsorption rate of larger molecules, such as m-xylene and mesitylene, diminished obviously with the increase of deposition amount of silicon oxide. The strong acid sites in internal surface on SiHβ was nearly unaltered, while weak acid sites on external surface was changed dramatically, which means that the Si(OEt) 4 did not enter the channels of Hβ. Both internal and external surface was covered when small molecule of (CH 3 ) 3 Si-O-Si(CH 3 ) 3 was used. The deposition samples revealed the shape-selective catalysis for larger molecules.
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