Abstract:Self‐organization driven by femtosecond‐laser texturing of crystalline Si in oxidation‐preventing methanol allows to create diverse anti‐reflective surface morphologies controlled by laser processing parameters. Electromagnetic processes dominating at initial steps of the progressive grating‐type morphology evolution define the onset of the hydrodynamic processes and resulting random spiky morphology upon subsequent multi‐pulse exposure. Upon systematic studies of femtosecond‐laser processing of monocrystalline Si in oxidation‐preventing methanol, it is shown that the electromagnetic processes dominating at initial steps of the progressive morphology evolution define the onset of the hydrodynamic processes and morphology upon subsequent multi‐pulse exposure. Under promoted exposure quasi‐regular subwavelength laser‐induced periodic surface structures (LIPSSs) are justified to evolve through the template‐assisted development of the Rayleigh‐Plateau hydrodynamic instability in the molten ridges forming quasi‐regular patterns with a supra‐wavelength periodicity and preferential alignment along polarization direction of the incident light. Subsequent exposure promotes fusion‐assisted morphology rearrangement resulting in a spiky surface with random orientation, yet constant inter‐structure distance correlated with initial LIPSS periodicity. Along with the insight onto the physical picture driving the morphology evolution and supra‐wavelength nanostructure formation, this experiments also demonstrated that resulting quasi‐regular and random spiky morphology can be tailored by the intensity/polarization distribution of incident laser beam allowing on‐demand surface nanotexturing with diverse hierarchical surface morphologies exhibiting reduced reflectivity at visible and shortwave‐IR wavelengths. Finally, the practical attractiveness of the suggested approach for improving near‐IR photoresponse and expanding operation spectral range of vertical p‐n junction Si photodetector operating under room temperature and zero‐bias conditions via single‐step annealing‐free nanopatterning is highlighted.

Excimer-laser-induced micropatterning of silicon dioxide on silicon substrates

Selected Two-Dimensional Effects in Gas Immersion Laser Doping of Unpatterned Silicon

Ripple Formation in Excimer Laser-Irradiated Silicon Dioxide/silicon System

Laser microstructuring of Si surfaces for low-threshold field-electron emission

Laser micro/nano machining of silicon

Control of the damage threshold of Si via a SiO2 coating upon irradiation with Mid-IR femtosecond laser pulses

Highly uniform silicon nanopatterning with deep-ultraviolet femtosecond pulses

Extreme Sub-Wavelength Structure Formation from Mid-IR Femtosecond Laser Interaction with Silicon

Sub-wavelength Ripple Formation on Silicon Induced by Femtosecond Laser Radiation

Processing Microstructure on Film by Femtosecond Laser

Sub-damage-threshold plasma etching and profile tailoring of Si through laser-stimulated thermal desorption

Controllable Si micro-structuring by temporally modulated single-shot femtosecond pulse lithography

The influence of ultrafast temporal energy regulation on the morphology of Si surfaces through femtosecond double pulse laser irradiation

Liquid-assisted laser nanotexturing of silicon: onset of hydrodynamic processes regulated by laser-induced periodic surface structures

Deep UV laser induced periodic surface structures on silicon formed by self-organization of nanoparticles

Ultrafast laser interaction with transparent multi-layer SiO2/Si3N4 films

Modifying single-crystal silicon and trimming silicon microring devices by femtosecond laser irradiation

Liquid‐Assisted Laser Nanotexturing of Silicon: Onset of Hydrodynamic Processes Regulated by Laser‐Induced Periodic Surface Structures

Mirostructure fabrication and research used the excimer laser microprocessing

One-Step femtosecond laser irradiation of Single-Crystal Silicon: Evolution of Micro-Nano structures and damage investigation

Evolution of micro/nano-structural arrays on crystalline silicon carbide by femtosecond laser ablation