Abstract:A new facility for microdiffraction strain measurements and microfluorescence mapping has been built on beamline 12.3.2 at the advanced light source of the Lawrence Berkeley National Laboratory. This beamline benefits from the hard x-radiation generated by a 6 T superconducting bending magnet (superbend). This provides a hard x-ray spectrum from 5 to 22 keV and a flux within a 1 microm spot of approximately 5x10(9) photons/s (0.1% bandwidth at 8 keV). The radiation is relayed from the superbend source to a focus in the experimental hutch by a toroidal mirror. The focus spot is tailored by two pairs of adjustable slits, which serve as secondary source point. Inside the lead hutch, a pair of Kirkpatrick-Baez (KB) mirrors placed in a vacuum tank refocuses the secondary slit source onto the sample position. A new KB-bending mechanism with active temperature stabilization allows for more reproducible and stable mirror bending and thus mirror focusing. Focus spots around 1 microm are routinely achieved and allow a variety of experiments, which have in common the need of spatial resolution. The effective spatial resolution (approximately 0.2 microm) is limited by a convolution of beam size, scan-stage resolution, and stage stability. A four-bounce monochromator consisting of two channel-cut Si(111) crystals placed between the secondary source and KB-mirrors allows for easy changes between white-beam and monochromatic experiments while maintaining a fixed beam position. High resolution stage scans are performed while recording a fluorescence emission signal or an x-ray diffraction signal coming from either a monochromatic or a white focused beam. The former allows for elemental mapping, whereas the latter is used to produce two-dimensional maps of crystal-phases, -orientation, -texture, and -strain/stress. Typically achieved strain resolution is in the order of 5x10(-5) strain units. Accurate sample positioning in the x-ray focus spot is achieved with a commercial laser-triangulation unit. A Si-drift detector serves as a high-energy-resolution (approximately 150 eV full width at half maximum) fluorescence detector. Fluorescence scans can be collected in continuous scan mode with up to 300 pixels/s scan speed. A charge coupled device area detector is utilized as diffraction detector. Diffraction can be performed in reflecting or transmitting geometry. Diffraction data are processed using XMAS, an in-house written software package for Laue and monochromatic microdiffraction analysis.

Linear Stage System with Subnanometer Resolution and Centimeters Travel Range

High Precision Positioning Mechanisms for a Hard X-ray Nanoprobe Instrument*

Mechanical design and development of compact linear nanopositioning flexure stages with centimeter-level travel range and nanometer-level resolution

Design For An X-Ray Nanoprobe Prototype With A Sub-10-Nm Positioning Requirement

X-ray microscopy instrumentation developments at NSLS-II: recent progress and future directions

Mechanical Design of a Precision Linear Flexural Stage for 3D X-Ray Diffraction Microscope at the Advanced Photon Source

Development of an Advanced Sample‐Scanning Stage System Prototype for an MLL‐Based Hard X‐ray Nanoprobe

Conceptual Design for A Beamline for A Hard X-Ray Nanoprobe with 30 Nm Spatial Resolution

Mechanical Design of Ultraprecision Weak-Link Stages for Nanometer-Scale X-Ray Imaging

Beamline Spectroscopy of Integrated Circuits With Hard X-ray Transition Edge Sensors at the Advanced Photon Source

Development of a Hard X–ray Nanoprobe Beamline at the Advanced Photon Source

Design of A Precision Flexural Linear Stage System with Sub-Nanometer Resolution and 12-Mm Travel Range

Precision Flexure Stages Design for a Compact Multilayer Laue Lens Test Bed for Hard X-ray Nanofocusing

Precision Mechanical Design Of An Ultrahigh-Resolution Inelastic X-Ray Scattering Spectrometer System With Cdfdw Optics At The Aps

Optomechanical Design of A Hard X-Ray Nanoprobe Instrument with Nanometer-Scale Active Vibration Control

A Novel Atomic Force Microscope with High Stability and Scan Speed

Design of a Dedicated Beamline for X-Ray Microfocusing- and Coherence-Based Techniques at the Advanced Photon Source

A Versatile High-Speed X-Ray Microscope for Sub-10 Nm Imaging

Optomechanical Design of A Modular K-B Mirror Mount System for X-Ray Microfocusing at the Advanced Photon Source

A Dedicated Superbend X-Ray Microdiffraction Beamline for Materials, Geo-, and Environmental Sciences at the Advanced Light Source

The APS X-ray Undulator Photon Beam Position Monitor and Tests at CHESS and NSLS