Structural Characteristics and Electrode Activities of Phosphorus Incorporated Tetrahedral Amorphous Carbon Films

Aiping Liu,Jiaqi Zhu,Manlin Tan,Xiao Han,Wangshou Chen,Jiecai Han

DOI: https://doi.org/10.1080/10426500701796108

2008-01-01

Abstract:Studies on structural properties and electrochemical behaviors of conductive phosphorus incorporated tetrahedral amorphous carbon (ta-C:P) films deposited using filtered cathodic vacuum arc technique with PH3 as the dopant source are presently reported. The structural characteristics of the films are characterized by X-ray photoelectron spectroscopy, Raman spectroscopy and Fourier transform infrared spectroscopy. The electrochemical reactivity of ta-C:P films are evaluated by cyclic voltammetry and differential pulse voltammetry. We find that phosphorus implantation enhances the clustering of sp2 sites dispersed in sp3 skeleton, develops the densities of π and π * states and improves the electrical and electrochemical behaviors of the films. It has been established that the inorganic films with amorphous structure appear excellent electrical conductivity and electrochemical activity similar to boron-doped diamond or nitrogen-doped amorphous carbon electrodes. These characteristics demonstrate greatly potential application of ta-C:P films as electrode materials in terms of its large electrochemical potential window, low background current, and a considerable electrochemical activity towards ferricyanide reduction and metal ions analysis.