The Research of Micro-structure on ZrO2 Photosensitive Gels Film by UV Exporsure

Xiang XU,Bin ZHOU,Jun SHEN,Xingyuan NI,Chao XU,Jinqiang HOU
DOI: https://doi.org/10.3321/j.issn:1005-023X.2005.09.037
2005-01-01
Abstract:ZrO_2 photosensitive gel films are derived from chemically modified-Alkoxide with benzoylacetone by sol-gel process.The gel films are dipcoated on silica substrate.The negative tone gel films are exposed by UV light through a mask and leached in alcohol.Finally the gratings with a period of 2~10μm and a depth of 120~200nm are obtained.The gratings are characterized with AFM,SEM,FTIR,et al.The Diffracting gratings provide a feasible ap- proach to optical communication and high laser fields
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