Low‐Temperature ABC‐Type Atomic Layer Deposition: Synthesis of Highly Uniform Ultrafine Supported Metal Nanoparticles

Junling Lu,Peter C. Stair
DOI: https://doi.org/10.1002/anie.200907168
2010-01-01
Angewandte Chemie
Abstract:Sheltered growth: A novel atomic layer deposition (ALD) method to synthesize highly uniform ultrafine supported metal nanoparticles is described. The ALD process includes growing protected metal nanoparticles and new support layers simultaneously at low temperature. In the final stage, the activation of the metal nanoparticles can be achieved by removing the protective ligands through calcination or reduction at elevated temperature (see picture). Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
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