Photosensitivity in GeO2–SiO2 Glasses and Optical Waveguides

Letian Zhang,Hanzhuang Zhang,Jian Wang,Jie Zheng,Wei Zheng,Yushu Zhang
DOI: https://doi.org/10.1016/j.matlet.2006.03.106
IF: 3
2006-01-01
Materials Letters
Abstract:Permanent refractive index changes caused by a KrF excimer laser operating at 248 nm in GeO2-SiO2 glasses deposited on Si (100) substrates using flame hydrolysis deposition (FHD) are presented. The sample was amorphouslike investigated by X-ray diffraction (XRD), and the ratio of Ge:Si is 14:86 from X-ray photoelectron spectroscopy (XPS) analysis. The 10-min irradiation with a KrF excimer laser (10 Hz, 187 mJ/cm(2)) induced a positive refractive index change of 0.341% at 1550 nm, which has achieved an international level of this field. An innovative photomask with a Cr-loaded structure coated on a UV quartz glass, was used to fabricate a 50 mu m gap with a period of 100 mu m waveguide grating under 1460 mJ/cm(2)/pulse at 6 Hz, and the diffraction patterns were observed clearly. The extinction coefficients of the samples are also measured over the range 250-1600 nm. (c) 2006 Elsevier B.V. All rights reserved.
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