Study on the Mechanical Behavior of Thin Film in Blister Test

张宁,聂璞林,李铸国,黄坚,陈秋龙,蔡珣
DOI: https://doi.org/10.15959/j.cnki.0254-0053.2010.01.007
2010-01-01
Abstract:The constitutive relation between external force(P) and central deflection(w_0) of thin film in blister test was studied by elasticity theory.The close form solutions on the external force and deflection were obtained for studying the constitutive relation in a range of w_0 =(10~(-2)~10~2) h,with h being the thickness of thin film.The stretching behavior of thin film and residual tensile stress were included into the analytical model.The results show that the constitutive relation is expressed as the form of P∝w_0~n, with n being the power.With respect to the deflection of thin film increasing,the dominant behavior of thin film changes from bending to stretching,and the constitutive relation changes from linear(n = 1) to cubic(n = 3).The analysis also shows that the external force needed to deflection thin film decreases with respect to the radius of thin film increasing,but increases with respect to the residual tensile stress increasing.Compared to those small deflection plate models that ignore the stretching of thin film,the present model is more suitable for the cases that the deflection of thin film in the blister is larger compared to the thickness of thin film.
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