Characterization of sputter-deposited hydrophobic chromium doped nickel alumnide coatings for mechanical and high-temperature oxidation-resistant applications
Sunil Kumar Tiwari,Akula Umamaheswara Rao,Archana Singh Kharb,Vipin Chawla,Neha Sardana,Paritosh Dubey,Piyush Chandra Verma,Sanjeev Kumar Dubey,Devesh Kumar Avasthi,Amit Kumar Chawla
DOI: https://doi.org/10.1007/s10853-024-10002-1
IF: 4.5
2024-07-20
Journal of Materials Science
Abstract:Ni 3 Al and Cr-Ni 3 Al films were deposited on Inconel-718 using the DC magnetron sputtering at a substrate temperature of 400 °C. The evolution of phase, microstructure, surface topography, and mechanical properties of the deposited films have been characterized using XRD, FESEM, AFM, and nanoindentation, respectively. The results of nanoindentation showed that the hardness, modulus, and adhesive strength of the coatings increased with increase in Cr concentration in the host Ni 3 Al matrix. The maximum hardness and modulus of 10.62 and 150.42 GPa respectively are shown by 5.7 at% of Cr-Ni 3 Al films. The cyclic oxidation tests were performed at elevated temperatures of 900 °C, 1000 °C, and 1100 °C in the open-air environment to study the actual oxidation attack. The results of the test showed that the rate of oxidation in Ni 3 Al and Cr-Ni 3 Al films was low as compared to the uncoated substrate. Ni 3 Al film doped with 5.7 at% of Cr-Ni 3 Al has resulted in providing better protection to the substrate against oxidation attacks. The surface morphology and elemental composition of the oxidized samples were investigated using FESEM and EDS to elucidate the surface scale analysis and mechanism of oxidation due to the formation of different oxide layers.
materials science, multidisciplinary