Step-Flow Growth of Heteroepitaxial Srruo3 Thin Films on 0.04 Degrees Srtio3 (001) Vicinal Substrates

T. J. Zhu,S. H. Yang,X. Chen,X. X. Liu,X. B. Zhao,L. Lu,M. O. Lai
DOI: https://doi.org/10.1142/s1793604708000290
IF: 1.4901
2008-01-01
Functional Materials Letters
Abstract:We have grown epitaxial SRO thin films of thickness of about 50 nm on the STO ( 001) substrates with a small miscut angle of 0.04 degrees by step-flow mode. A mode transition from two-dimensional mixed growth of layer-by-layer and step-flow growth to complete step-flow growth was observed, which is associated with the change in the surface mobility of adatoms and the rate of edge diffusion along the steps.
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