The Effects of Vacuum Annealing on the Structure of VO2 Thin Films

Y. L. Wang,M. C. Li,L. C. Zhao
DOI: https://doi.org/10.1016/j.surfcoat.2006.09.097
2007-01-01
Abstract:Noncrystalline VOx thin films were deposited onto p-doped Si (100) substrates at 400 degrees C using magnetron sputtering. By vacuum annealing, we obtained polycrystalline VO2 thin films with two different structures under a variety of annealing conditions. With the annealing temperature increasing and the annealing time developing, structures of the films underwent the following transformation: amorphous structure -> metastable VO2 (B)-> VO2 (B)+VO2 (M). Vacuum annealing is useful of acquiring VO2 thin films with high surface quality, but too high annealing temperature (500 degrees C) and too long time (15 h) are harmful, which make the surface degenerate. (c) 2006 Elsevier B.V, All rights reserved.
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