Influences Of H2o On The Structure And Properties Of Sn : F Film

Zhao Hongli,Liu Qiying,Yang Jingkai,Liu Yanli,Zhang Fucheng
DOI: https://doi.org/10.1016/S1875-5372(09)60027-8
2008-01-01
Rare Metal Materials and Engineering
Abstract:F-doped tin oxide (Sn:F) film was prepared by atmosphere pressure chemical vapor deposition (APCVD) on float glass using monobutyltin trichloride (C4H9SnCl3, MBTC) and trifluoro acetic acid (CF3COOH, TFA) as the precursor and dopant, respectively. Different concentrations of H2O were used as the activator. The prepared films,were characterized by means of XRD, SEM, and UV-VIS-NIR spectroscopy. Experimental results reveal that the structures and properties of the films are greatly affected by the H2O.
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